Thông số CD cho mặt nạ đường cong

Within the photomask industry, there’s a major transformation from conventional Manhattan masks to more advanced curvilinear masks. Researchers from D2S and Micron Technology propose an equivalent CD spec for the curvy masks and use this spec to show that curvy masks have smaller mask variations than Manhattan masks.

Find the technical paper here. Published June 2024.

Linyong (Leo) Pang, Dakota Seal, Tom Boettiger, Nagesh Shirali, Grace Dai, and Aki Fujimura “Curvilinear mask metrology: what is the equivalent critical dimension?,” Journal of Micro/Nanopatterning, Materials, and Metrology 23(2), 021304 (27 June 2024). https://doi.org/10.1117/1.JMM.23.2.021304