Nắm vững độ chính xác nguyên tử – Vai trò của ALD trong các tiến bộ về chất bán dẫn

Atomic layer deposition (ALD) is a thin-film deposition method that continues to enable continuous advances in semiconductor device fabrication. Essentially, it involves exposing substrates sequentially to at least two different vapor phase atmospheres in which self-limiting reactions take place on the surface: the first… Read More

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