Cryogenic Etching – Lam Research Blog
Low temperature, cryogenic etching enables the use of new, novel chemistries to deliver increased high aspect ratio etch capability. Cryogenic delivers enhanced etch rates, vertical high aspect ratio profiles, and reduces the environmental impact of the etching process.
Lam’s cryogenic dielectric etch technology is compatible with Lam’s popular Flex® dielectric etch technology and Vantex® reactive ion etch systems on the Sense.i® platform – enabling customers to easily leverage and expand on investment in their existing infrastructure.
Atomic Layer Etch (ALE) Cryogenic Etching Reactive Ion Etch (RIE)
Our dielectric etch systems offer application-focused capabilities for creating a wide range of challenging structures in advanced devices.
Cryogenic Etching Reactive Ion Etch (RIE)
Designed for the Sense.i platform, Vantex redefines high aspect ratio etching with innovations in technology and Equipment Intelligence.
